FIELD EMISSION SCANNING ELECTRON MICROSCOPE(FESEM)

GEMINISEM 450

• Acceleration voltage Range – 0.02 -30 KV
• Resolution 1.5 nm @200 V
• Filament – Schottky field emitter
•  Adjustment – Continuously variable in 10volt steps.
• Probe current – 40 nA configuration – 3 pA – 40 nA

                           100 nA configuration – 3 pA – 100 nA

                           300 nA configuration – 3 pA – 300 nA

• Magnification – 12x – 20,00000x reference to polaroid 5” *4.5” image format.
• Objective lens – Gemini II electromagnetic objective lens.80 degree conical final- lens with water cooling including double condenser lens.
•  Working Distance -range 0.1 mm – 50 mm.
•  Specimen chamber – 330 mm inner diameter

                                       270 mm height

•  Specimen stage – 5 axes motorized eucentric,controlled fromsmartSEM user interface,operated by a dual joystick control box.

Field Emission Scanning Electron Microscopy (FESEM) is used for ultra-high-resolution surface topography analysis and nanoscale material characterization .

Key Applications:

Materials Study

• Analysis of surface morphology and microstructure 
• Grain size and phase distribution studies 
• Fracture and failure analysis of metals, ceramics, and polymers 
• Investigation of coatings and thin films  
• Characterization of nanoparticles, nanowires, nanotubes, and quantum dots 

Key Advantages of FESEM

• Very high resolution (nanometer-scale imaging)
• Greater depth of field than optical microscopy
• High-quality surface imaging
• Capability for elemental analysis when coupled with EDS/EDX detectors

• Ultrahigh resolutions imaging
• High Magnification 
• Surface Morphology Analysis 
• Imaging of Non-Conductive Materials 
• Elemental Analysis 
• Large Depth of Field 
• Low Voltage Imaging 
• Failure and Defect Analysis

1. Prof. Shanta Chakrabarty
2. Dr. Gopal K. Pradhan